Ihre Aufgaben:
* Take ownership of advanced patterning processes such as Optical Proximity Correction (OPC), lithography simulation, and proximity effect correction (PEC) for electron beam lithography (EBL), including the development of internal capabilities in these areas
* Lead the development of specialized lithographic technologies and contribute to the strategic direction of patterning innovations in alignment with broader technology roadmaps
* Play a central role in shaping the OPC technology strategy and future roadmap
* Initiate and manage collaborative R&D projects with leading European institutions, including universities, research centers, and industry partners
* Work closely with cross-functional teams to transfer and scale proven technologies across locations
* Support the growth of internal expertise in computational optics and lithography through team development and knowledge building
Ihre Qualifikationen:
* PhD in physics (semiconductor), material science, or similar discipline in Nano-Technology Engineering area
* Solid experience in the field of modelling lithographic process with DUV light sources and EBL
* Practical experience of mask preparation and validation is advantageous
* Good sense and ability to identify new advanced technologies and to resolvestrategical challenges in a complex environment, cooperation driven mentality with high potential to enable new strategic opportunities
* Strategic thinking, well-organized and independent way of working
* Can-do spirit, and willing to step out of comfort zone for extra mile
* Excellent communication and presentation skills in English - Chinese is advantageous
* Ability to cooperate effectively and participate in in multicultural and interdisciplinary teams
Ihre Vorteile:
* Challenging and varied tasks in a forward-looking and innovative industry
* A dynamic and progressive market environment
* A highly motivated team and an open communication culture